• DocumentCode
    2480098
  • Title

    Electron lithography for optoelectronics

  • Author

    Clements, S.J. ; Butler, M.J. ; Shepherd, F.R.

  • Author_Institution
    BNR Europe Ltd., Harlow, UK
  • fYear
    1993
  • fDate
    15-18 Nov 1993
  • Firstpage
    26
  • Lastpage
    27
  • Abstract
    Electron lithography has been widely used in the electronic integrated circuit industry but is being increasingly exploited for the new range of optoelectronic and optical devices currently being developed. This paper will describe its use in some of these applications and its progress in critical areas as well as prospects for the future
  • Keywords
    electron beam lithography; electron resists; masks; optical fabrication; optoelectronic devices; electron lithography; electronic integrated circuit industry; optical devices; optoelectronic devices; optoelectronics; Distributed feedback devices; Electron optics; Gratings; Lithography; Optical device fabrication; Optical devices; Optical feedback; Optical sensors; Optoelectronic devices; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society Annual Meeting, 1993. LEOS '93 Conference Proceedings. IEEE
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-1263-5
  • Type

    conf

  • DOI
    10.1109/LEOS.1993.379144
  • Filename
    379144
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2480098