Title :
Electron lithography for optoelectronics
Author :
Clements, S.J. ; Butler, M.J. ; Shepherd, F.R.
Author_Institution :
BNR Europe Ltd., Harlow, UK
Abstract :
Electron lithography has been widely used in the electronic integrated circuit industry but is being increasingly exploited for the new range of optoelectronic and optical devices currently being developed. This paper will describe its use in some of these applications and its progress in critical areas as well as prospects for the future
Keywords :
electron beam lithography; electron resists; masks; optical fabrication; optoelectronic devices; electron lithography; electronic integrated circuit industry; optical devices; optoelectronic devices; optoelectronics; Distributed feedback devices; Electron optics; Gratings; Lithography; Optical device fabrication; Optical devices; Optical feedback; Optical sensors; Optoelectronic devices; Production;
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1993. LEOS '93 Conference Proceedings. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-1263-5
DOI :
10.1109/LEOS.1993.379144
