DocumentCode
2481103
Title
Thermoelectric properties of SiC thin films
Author
Kawahara, T. ; Inai, H. ; Okamoto, Y. ; Morimoto, J.
Author_Institution
Dept. of Mater. Sci. & Eng., Nat. Defense Acad., Yokosuka, Japan
fYear
1998
fDate
24-28 May 1998
Firstpage
260
Lastpage
263
Abstract
Silicon carbide is expected to be a hard thermoelectric material which can be used at high temperature. Recently, a low dimensional structure has been fabricated as new materials such as thin films. We made thin films of SiC by the evaporation technique with several metal dopants which are silver, nickel and copper. These dopants act as p-type acceptors and could reduce the resistance of SiC and raise the performance as thermoelectric materials. In the 5 wt.% Ag doped samples, the thermoelectric power is about 10 μV/K at 500°C and the temperature dependence of the thermoelectric power is weak in all samples. The thermoelectric power is smaller than that of the bulk samples with the same dopants for SiC/Cu and SiC/Ag, and larger for SiC/Ni. The electrical conductivity increases as temperature increases. SiC/Ag thin films have large conductivity compared with the bulk samples. In the SiC/Ni films, the conductivity is also enhanced and the thermoelectric properties are improved at high temperature
Keywords
copper; electrical conductivity; impurity states; nickel; semiconductor thin films; silicon compounds; silver; thermoelectric power; wide band gap semiconductors; 500 C; SiC thin films; SiC:Ag; SiC:Cu; SiC:Ni; SiC:Ni,Cu,Ag; copper; electrical conductivity; evaporation technique; hard thermoelectric material; high temperature; low dimensional structure; nickel; p-type acceptors; silicon carbide; silver; temperature dependence; thermoelectric properties; Conductive films; Conductivity; Copper; Nickel; Silicon carbide; Silver; Temperature dependence; Thermal resistance; Thermoelectricity; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Thermoelectrics, 1998. Proceedings ICT 98. XVII International Conference on
Conference_Location
Nagoya
ISSN
1094-2734
Print_ISBN
0-7803-4907-5
Type
conf
DOI
10.1109/ICT.1998.740367
Filename
740367
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