• DocumentCode
    2483226
  • Title

    Dependency of growth of Arabidopsis thaliana on intensity of D.C. electric field

  • Author

    Okumura, Takamasa ; Muramoto, Yuji ; Shimizu, Noriyuki

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Meijo Univ., Nagoya, Japan
  • fYear
    2012
  • fDate
    14-17 Oct. 2012
  • Firstpage
    255
  • Lastpage
    258
  • Abstract
    We have studied the influence of electric field on plant growth. In previous papers, we reported that the D.C. electric field increases the seed germination rate, weight and length of daikon radish. We also obtain the similar effects for thale cress. It is reasonable to expect that there is an optimum intensity of D.C. electric field for plant growth improvement. As the first step to seek out the optimum intensity, the seeds of thale cress were cultivated under three circumstances; 0.0kV/m, 2.5kV/m, and 10.0kV/m of D.C. field. As a result, the growth is most increased by the 10.0kV/m; therefore, we estimated the optimum intensity to be higher than 2.5kV/m. In this paper, the detailed dependency of the growth of thale cress on the intensity of the D.C. electric field is studied.
  • Keywords
    biological effects of fields; botany; DC electric field; arabidopsis thaliana growth; daikon radish length; daikon radish weight; plant growth improvement; seed germination rate; Acceleration; Corona; Discharges (electric); Electric fields; Electrodes; Electrostatics; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation and Dielectric Phenomena (CEIDP), 2012 Annual Report Conference on
  • Conference_Location
    Montreal, QC
  • ISSN
    0084-9162
  • Print_ISBN
    978-1-4673-1253-0
  • Electronic_ISBN
    0084-9162
  • Type

    conf

  • DOI
    10.1109/CEIDP.2012.6378769
  • Filename
    6378769