DocumentCode
2484537
Title
Computer modelling of copper vapour lasers
Author
Carman, Robert J.
Author_Institution
Centre for Lasers & Applications, Macquarie Univ., North Ryde, NSW, Australia
fYear
1993
fDate
15-18 Nov 1993
Firstpage
749
Lastpage
750
Abstract
The computer model has been developed with view to simulating the observed experimental behaviour of a copper vapour laser (CVL) using a minimum of input parameters into the calculations. Therefore, self-consistent approach is used whereby the behaviour of the plasma is simulated through multiple excitation/relaxation cycles until the shot-to-shot variation of the predicted results converges to within an acceptable tolerance (<1%)
Keywords
computer aided analysis; copper; gas lasers; laser theory; modelling; plasma; plasma simulation; Cu; acceptable tolerance; computer model; computer modelling; copper vapour lasers; input parameters; multiple excitation/relaxation cycles; plasma simulation; self-consistent approach; shot-to-shot variation; Application software; Computational modeling; Copper; Electrons; Kinetic theory; Laser excitation; Laser modes; Plasma measurements; Plasma temperature; Pump lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society Annual Meeting, 1993. LEOS '93 Conference Proceedings. IEEE
Conference_Location
San Jose, CA
Print_ISBN
0-7803-1263-5
Type
conf
DOI
10.1109/LEOS.1993.379408
Filename
379408
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