• DocumentCode
    2492566
  • Title

    Channel temperature measurement of GaAs devices using an atomic force microscope

  • Author

    Anderson, W.T. ; Mittereder, J.A. ; Roussos, J.A.

  • Author_Institution
    Naval Res. Lab., Washington, DC, USA
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    3
  • Lastpage
    9
  • Abstract
    We have used an atomic force microscope (AFM) to measure the channel temperature of GaAs pseudomorphic high electron mobility transistors (PHEMTs) and GaAs metal-semiconductor field effect transistors (MESFETs) by employing a temperature sensitive tip. The improvements with this method are to greatly expand the range over which the channel temperature can be measured and to improve the spatial resolution into the submicrometer range. To our knowledge, this is the first report of an accurate, quantitative measurement of the channel temperature of a compound semiconductor device using an AFM
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; atomic force microscopy; gallium arsenide; high electron mobility transistors; semiconductor device measurement; temperature measurement; GaAs; MESFET; PHEMT; atomic force microscopy; channel temperature measurement; compound semiconductor device; Atomic force microscopy; Atomic measurements; Electron microscopy; Electron mobility; FETs; Force measurement; Gallium arsenide; PHEMTs; Temperature measurement; Temperature sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    GaAs Reliability Workshop, 1999. Proceedings
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    0-7908-0100-0
  • Type

    conf

  • DOI
    10.1109/GAASRW.1999.874092
  • Filename
    874092