DocumentCode :
2492751
Title :
Fabrication and characterization of deeply-etched SiO2 waveguides
Author :
Sheng, Zhen ; Yang, Liu ; Dai, Daoxin ; Lang, Tingting ; Wang, Zhechao
Author_Institution :
Zhejiang Univ., Hangzhou
fYear :
2007
fDate :
17-19 Oct. 2007
Firstpage :
517
Lastpage :
519
Abstract :
Deeply-etched SiO2 waveguide is fabricated and characterized. The fabrication process is easier than the conventional buried SiO2 waveguide. The fabricated waveguide exhibits good performances, such as low propagation loss, broad band.
Keywords :
etching; optical fibre fabrication; silicon compounds; SiO2; buried SiO2 waveguide; deeply-etched SiO2 waveguides; optical fibre fabrication; Electromagnetic waveguides; Etching; Optical buffering; Optical device fabrication; Optical losses; Optical scattering; Optical waveguides; Propagation losses; Silicon compounds; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fiber Communication and Optoelectronics Conference, 2007 Asia
Conference_Location :
Shanghai
Print_ISBN :
978-0-9789217-2-9
Electronic_ISBN :
978-0-9789217-2-9
Type :
conf
DOI :
10.1109/AOE.2007.4410860
Filename :
4410860
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2492751
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