DocumentCode
2493387
Title
RF overdrive experiments on 0.5 μm power pHEMTs
Author
Kaper, V. ; Ersland, P.
Author_Institution
M/A-COM, Lowell, MA, USA
fYear
1999
fDate
1999
Firstpage
61
Lastpage
68
Abstract
The effect of large signal drive on long-term device reliability was investigated on M/A-COM 0.5 μm power pHEMTs with 600 μm gate periphery by stressing devices on-wafer at normal gate and accelerated drain bias conditions with various RF input drives in the high compression regime (RF overdrive condition). Complete DC characterization and input/output power measurements were performed every 5 minutes during the stress
Keywords
power HEMT; semiconductor device reliability; 0.5 micron; RF overdrive; power pHEMT; reliability; Circuit testing; Degradation; Gallium arsenide; PHEMTs; Performance evaluation; Power measurement; RF signals; Radio frequency; Stress; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
GaAs Reliability Workshop, 1999. Proceedings
Conference_Location
Monterey, CA
Print_ISBN
0-7908-0100-0
Type
conf
DOI
10.1109/GAASRW.1999.874136
Filename
874136
Link To Document