Title :
Highly abrupt modulation Zn doping in LP-MOVPE grown InAlAs as applied to quantum well electron transfer structures for optical switching
Author :
Reier, F.W. ; Agrawal, N. ; Harde, P. ; Bochnia, R.
Author_Institution :
Heinrich-Hertz-Inst. fuer Nachrichtentechnik Berlin GmbH, Germany
Abstract :
Acceptor incorporation with sharp doping interfaces is required for a variety of long wavelength optoelectronic devices. However, relatively strong diffusion effects are observed in the InGaAsP materials especially as the alloy bandgap increases. To overcome this difficulty, the Zn acceptor doping is studied for low pressure metal organic vapor phase epitaxial grown InAlAs lattice matched to InP for applications in electron transfer structures for optical switching. The optimized growth conditions for Zn doping including the effect of source materials are described in detail. Results which demonstrate highly abrupt modulation Zn doping obtained in multi quantum well structures are presented
Keywords :
III-V semiconductors; aluminium compounds; indium compounds; optical switches; optoelectronic devices; semiconductor doping; semiconductor growth; semiconductor quantum wells; vapour phase epitaxial growth; zinc; InP-InAlAs:Zn; LP-MOVPE grown; Zn doping; acceptor incorporation; bandgap; diffusion effects; highly abrupt modulator; lattice matched; long wavelength optoelectronic devices; multi quantum well structures; optical switching; optimized growth conditions; quantum well electron transfer structures; sharp doping interfaces; source materials; Doping; Electron optics; Indium compounds; Indium phosphide; Lattices; Optical materials; Optical modulation; Optoelectronic devices; Photonic band gap; Zinc;
Conference_Titel :
Indium Phosphide and Related Materials, 1993. Conference Proceedings., Fifth International Conference on
Conference_Location :
Paris
Print_ISBN :
0-7803-0993-6
DOI :
10.1109/ICIPRM.1993.380547