DocumentCode
2497204
Title
Piezoresistive Gas Flow Sensors by Deep RIE Technology
Author
Lee, Young-Tae ; Ahn, Kang-Ho ; Kwon, Yong-Taek ; Takao, Hidekuni ; Ishida, Makoto
Author_Institution
Andong Nat. Univ., Andong
fYear
2006
fDate
22-25 Oct. 2006
Firstpage
1115
Lastpage
1118
Abstract
In this paper, we fabricated drag force type gas flow sensor with dry etching technology which used deep RIE (reactive ion etching) and etching stop technology which used SOI (silicon-on-insulator). we fabricated two kinds of sensor, which are cantilever type and paddle type. Both cantilever and paddle type flow sensors have similar sensitivity as 0.03 mV/VldrkPa.
Keywords
flow sensors; piezoresistive devices; silicon-on-insulator; sputter etching; SOI; cantilever type sensor; deep RIE technology; drag force type sensor; dry etching; etching stop technology; paddle type sensor; piezoresistive gas flow sensors; reactive ion etching; silicon-on-insulator; Biosensors; Drag; Dry etching; Fluid flow; Force sensors; Gas detectors; Intelligent sensors; Piezoresistance; Sensor phenomena and characterization; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2006. 5th IEEE Conference on
Conference_Location
Daegu
ISSN
1930-0395
Print_ISBN
1-4244-0375-8
Electronic_ISBN
1930-0395
Type
conf
DOI
10.1109/ICSENS.2007.355821
Filename
4178816
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