DocumentCode :
2497204
Title :
Piezoresistive Gas Flow Sensors by Deep RIE Technology
Author :
Lee, Young-Tae ; Ahn, Kang-Ho ; Kwon, Yong-Taek ; Takao, Hidekuni ; Ishida, Makoto
Author_Institution :
Andong Nat. Univ., Andong
fYear :
2006
fDate :
22-25 Oct. 2006
Firstpage :
1115
Lastpage :
1118
Abstract :
In this paper, we fabricated drag force type gas flow sensor with dry etching technology which used deep RIE (reactive ion etching) and etching stop technology which used SOI (silicon-on-insulator). we fabricated two kinds of sensor, which are cantilever type and paddle type. Both cantilever and paddle type flow sensors have similar sensitivity as 0.03 mV/VldrkPa.
Keywords :
flow sensors; piezoresistive devices; silicon-on-insulator; sputter etching; SOI; cantilever type sensor; deep RIE technology; drag force type sensor; dry etching; etching stop technology; paddle type sensor; piezoresistive gas flow sensors; reactive ion etching; silicon-on-insulator; Biosensors; Drag; Dry etching; Fluid flow; Force sensors; Gas detectors; Intelligent sensors; Piezoresistance; Sensor phenomena and characterization; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2006. 5th IEEE Conference on
Conference_Location :
Daegu
ISSN :
1930-0395
Print_ISBN :
1-4244-0375-8
Electronic_ISBN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2007.355821
Filename :
4178816
Link To Document :
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