Title :
Electron transport characteristics in wurtzite phase GaN and SiC for high-power and high-temperature device modeling
Author_Institution :
Dept. of Phys., Tarbiat Moallem Univ., Sabzevar, Iran
Abstract :
Temperature and doping dependencies of electron mobility in wurtzite GaN and SiC structures have been calculated using an iterative technique. The following scattering mechanisms, i.e., impurity, polar optical phonon, acoustic phonon, piezoelectric and electron plasmon are included in the calculation. Ionized impurity scattering has been treated beyond the Born approximation using the phase-shift analysis. It is found that the electron mobility decreases monotically as the temperature increases from 100K to 500K. The low temperature value of electron mobility increases significantly with increasing doping concentration. The iterative results are in fair agreement with other recent calculations obtained using the relaxation-time approximation and experimental methods.
Keywords :
III-V semiconductors; doping profiles; electron mobility; electron transport theory; gallium compounds; high-temperature electronics; impurity scattering; plasmons; semiconductor device models; silicon compounds; wide band gap semiconductors; 100 to 500 K; Born approximation; GaN; SiC; Wurtzite phase; acoustic phonon; device modeling; doping concentration; doping dependencies; electron plasmon; electron transport; ionized impurity scattering; iterative technique; phase-shift analysis; piezoelectric plasmon; polar optical phonon; relaxation-time approximation; scattering mechanisms; temperature dependencies; Acoustic scattering; Doping; Electron mobility; Gallium nitride; Impurities; Optical scattering; Phonons; Semiconductor process modeling; Silicon carbide; Temperature;
Conference_Titel :
Electron Devices for Microwave and Optoelectronic Applications, 2003. EDMO 2003. The 11th IEEE International Symposium on
Print_ISBN :
0-7803-7904-7
DOI :
10.1109/EDMO.2003.1260079