• DocumentCode
    2497597
  • Title

    Forming of AlGaAs nanodiode current-voltage characteristics

  • Author

    Lvanov, Yu A. ; Malischev, K.V. ; Fedorkova, N.V.

  • Author_Institution
    N.E. Bauman MSTU, Moscow State Tech. Univ., Russia
  • fYear
    2004
  • fDate
    13-17 Sept. 2004
  • Firstpage
    532
  • Lastpage
    534
  • Abstract
    The analytic formula for AlxGa1-xAs resonant-tunneling diode current-voltage characteristic (VCC) is obtained. It is applicable at the following restrictions: (1) the voltage across the diode is less then Upeak; (2) the mole fraction × Al in barrier AlxGa1-xAs layers is more than 0.4; and (3) thickness of well GaAs layer is from 5 to 10 GaAs layers. The diagrams (degree of power-behaved VCC parameters of layers) and technological parameter tolerance are obtained from this formula. VCC shape I∼Un alters from n=1 up to n=5, when parameters of layers are changed. Parameters of layers were determined for I∼U3 VCC, diodes were made and subharmonic mixers on their basis were investigated. Good agreement of experiments with the theory is obtained.
  • Keywords
    aluminium compounds; gallium arsenide; nanoelectronics; quantum well devices; resonant tunnelling diodes; AlxGa1-xAs; AlGaAs nanodiode; current-voltage characteristics; resonant-tunneling diode; well thickness; Current-voltage characteristics; Electrochemical machining; Helium; IEEE catalog; Plasma welding; Shape;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Telecommunication Technology, 2004. CriMico 2004. 2004 14th International Crimean Conference on
  • Print_ISBN
    966-7968-69-3
  • Type

    conf

  • DOI
    10.1109/CRMICO.2004.183321
  • Filename
    1390303