2498344

Is NMOSFET Hot Carrier Lifetime Degraded By Charging Damage?

Cheung, K.P. ; Misra, D. ; Steiner, K.G. ; ColonelI, J.I. ; Chang, C.P. ; Lai, W.Y.C. ; Liu, C.T. ; Liu, R. ; Pai, C.S.

Lucent Technologies

1997

13-14 May 1997

186

188

CMOS process; CMOS technology; Degradation; Electron traps; Hot carriers; MOSFET circuits; Plasma density; Plasma measurements; Stress; Substrate hot electron injection;

English

ieee

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Monterey, California, USA

0-9651-5771-7

conf

10.1109/PPID.1997.596737

596737