DocumentCode :
2498734
Title :
Diffusion length variation in 0.5 and 3 MeV proton irradiated heteroepitaxial indium phosphide solar cells
Author :
Jain, R.K. ; Weinberg, I. ; Flood, D.J.
Author_Institution :
NASA Lewis Res. Center, Cleveland, OH, USA
fYear :
1993
fDate :
19-22 Apr 1993
Firstpage :
596
Lastpage :
599
Abstract :
The authors report on the effect of 0.5 and 3.0 MeV proton irradiation on the base diffusion length of InP cells grown on GaAs substrates with InxGa1-xAs graded intermediate layers (C. J. Keavney et al., 1991). The cell efficiency changes due 0.5 and 3 MeV proton irradiations have been explained by the variation of the base diffusion length. The 0.5 MeV protons influence the cell performance more strongly than the 3 MeV protons. Computer simulations were used to determine the variation of the base diffusion length with proton fluence for both the energies. The diffusion length damage coefficient (KL) has been calculated and is constant with fluence. The damage coefficient for 0.5 MeV protons is an order of magnitude higher than for 3 MeV protons. The effect of carrier removal has been considered in the calculations
Keywords :
III-V semiconductors; carrier lifetime; gallium arsenide; indium compounds; proton effects; solar cells; 0.5 MeV; 3 MeV; GaAs; GaAs substrates; InxGa1-xAs graded intermediate layers; InP cells; InP-InGaAs-GaAs; base diffusion length; carrier removal; cell efficiency; computer simulation; diffusion length damage coefficient; proton fluence; proton irradiated heteroepitaxial indium phosphide solar cells; proton irradiation; Costs; Current measurement; Electrons; Gallium arsenide; Indium phosphide; NASA; Photovoltaic cells; Protons; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1993. Conference Proceedings., Fifth International Conference on
Conference_Location :
Paris
Print_ISBN :
0-7803-0993-6
Type :
conf
DOI :
10.1109/ICIPRM.1993.380625
Filename :
380625
Link To Document :
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