DocumentCode
2498742
Title
Depth dependence of modified bond on surface processed PTFE using high E/n discharge
Author
Hamamura, N. ; Yumoto, M. ; Sakai, T.
Author_Institution
Musashi Inst. of Technol., Tokyo, Japan
fYear
1998
fDate
27-30 Sep 1998
Firstpage
163
Lastpage
168
Abstract
The authors have studied on collision process in the discharge under high E/n conditions. From the results, it was deduced that many activated species are generated in the discharge. Using the discharge, surface processing of PTFE (Poly-Tetra-Fluoro-Ethylene) was carried out. As the result, a surface wettability was increased. During the processing, the sample on the cathode was irradiated by ions with kinetic energy. It is considered that these ions may implant into the surface. The range of ions in a sample is different from each molecule. Then, it is assumed that a wettability is not always increased by the processing, because the modification by ion occurs at different depth depending on mass of molecules. To make clear a difference of modification depth on PTFE, the processing was carried out using noble gases and the depth profile by the XPS analysis using the TOA (Take-Off-Angle) resolution was obtained. A result showed that the modified layer is relatively uniform using He gas and its density is lower than another noble gas
Keywords
X-ray photoelectron spectra; bonds (chemical); discharges (electric); ion beam effects; polymers; surface treatment; wetting; PTFE; XPS; bond modification; collision process; depth profile; high E/n discharge; ion irradiation; noble gas; polytetrafluoroethylene; surface processing; take-off-angle resolution; wettability; Argon; Bonding; Cathodes; Gases; Helium; Kinetic energy; Metastasis; Nitrogen; Polymers; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Insulating Materials, 1998. Proceedings of 1998 International Symposium on
Conference_Location
Toyohashi
Print_ISBN
4-88686-050-8
Type
conf
DOI
10.1109/ISEIM.1998.741711
Filename
741711
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