• DocumentCode
    2499193
  • Title

    Iron (Fe) concentration dependence of photoluminescence spectra in InP

  • Author

    Shinaga, H. ; Makita, Y. ; Yamada, Akimasa ; Iida, T. ; Niki, S. ; Matsumori, T. ; Kainosho, K. ; Oda, O.

  • Author_Institution
    Tokai Univ., Hiratsuka, Kanagawa, Japan
  • fYear
    1993
  • fDate
    19-22 Apr 1993
  • Firstpage
    317
  • Lastpage
    320
  • Abstract
    Recently, a dramatic decrease of residual impurity concentration was achieved in liquid encapsulated Czochralski (LEC) grown InP. In the case of undoped InP, the main residual impurity is Si, which acts as a shallow donor and is incorporated into the InP during the synthesis of polycrystalline InP. Undoped semi-insulating (SI) InP wafers were obtained by high-temperature annealing under high phosphorus (P) over pressure. These undoped LEC InP can now present electric resistivity as high as 1.0 × 107 ohm.cm with mobilities greater than 4000 cm2V-1s-1. Iron (Fe) in InP acts as a deep acceptor and is frequently used to obtain a SI InP. Its energy level is located at about 0.78 eV above the top of the InP valence band. The authors present the results of dilute Fe doping into the high quality InP during LEC growth. They focus on the low temperature photoluminescence properties as a function of Fe concentration
  • Keywords
    III-V semiconductors; annealing; crystal growth from melt; deep levels; electrical resistivity; indium compounds; iron; photoluminescence; semiconductor doping; Fe concentration; InP:Fe; LEC growth; deep acceptor; dilute Fe doping; electric resistivity; high-temperature annealing; photoluminescence; residual impurity concentration; semi-insulating; semiconductor; wafers; Annealing; Detectors; Electric variables measurement; Excitons; Gallium arsenide; Indium phosphide; Iron; Photoluminescence; Photomultipliers; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1993. Conference Proceedings., Fifth International Conference on
  • Conference_Location
    Paris
  • Print_ISBN
    0-7803-0993-6
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1993.380646
  • Filename
    380646