• DocumentCode
    2499599
  • Title

    Hot-electron-induced minority carrier generation in bipolar junction transistors

  • Author

    Ishiuchi, H. ; Tamba, N. ; Shott, J.D. ; Knorr, C.J. ; Wong, S.S.

  • Author_Institution
    Integrated Circuits Lab., Stanford Univ., CA, USA
  • fYear
    1989
  • fDate
    3-6 Dec. 1989
  • Firstpage
    803
  • Lastpage
    806
  • Abstract
    The authors report the observation and analysis of minority carrier generation in the collector and the substrate of n-p-n bipolar junction transistors as a result of photons which are generated in the collector-base depletion region. Both the substrate current and the additional leakage current in an adjacent n/sup +/-p junction peak at V/sub BE/ approximately=0.8 V. In the authors´ model of the phenomena, the photons induce carriers both in the depletion region and in the neutral region. The generated minority carriers in the neutral region diffuse and contribute to the substrate current and the junction leakage current.<>
  • Keywords
    bipolar transistors; hot carriers; semiconductor device models; collector-base depletion region; hot electron induced minority carrier generation; junction leakage current; leakage current; models; n-p-n bipolar junction transistors; neutral region; photon generation; photons induce carriers; substrate current; Bipolar transistor circuits; Current measurement; Doping; Laboratories; Leakage current; MOSFETs; Photonic integrated circuits; Semiconductor process modeling; Substrates; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0817-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1989.74175
  • Filename
    74175