DocumentCode
2499599
Title
Hot-electron-induced minority carrier generation in bipolar junction transistors
Author
Ishiuchi, H. ; Tamba, N. ; Shott, J.D. ; Knorr, C.J. ; Wong, S.S.
Author_Institution
Integrated Circuits Lab., Stanford Univ., CA, USA
fYear
1989
fDate
3-6 Dec. 1989
Firstpage
803
Lastpage
806
Abstract
The authors report the observation and analysis of minority carrier generation in the collector and the substrate of n-p-n bipolar junction transistors as a result of photons which are generated in the collector-base depletion region. Both the substrate current and the additional leakage current in an adjacent n/sup +/-p junction peak at V/sub BE/ approximately=0.8 V. In the authors´ model of the phenomena, the photons induce carriers both in the depletion region and in the neutral region. The generated minority carriers in the neutral region diffuse and contribute to the substrate current and the junction leakage current.<>
Keywords
bipolar transistors; hot carriers; semiconductor device models; collector-base depletion region; hot electron induced minority carrier generation; junction leakage current; leakage current; models; n-p-n bipolar junction transistors; neutral region; photon generation; photons induce carriers; substrate current; Bipolar transistor circuits; Current measurement; Doping; Laboratories; Leakage current; MOSFETs; Photonic integrated circuits; Semiconductor process modeling; Substrates; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
Conference_Location
Washington, DC, USA
ISSN
0163-1918
Print_ISBN
0-7803-0817-4
Type
conf
DOI
10.1109/IEDM.1989.74175
Filename
74175
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