DocumentCode
2500447
Title
Perspectives of the VGF growth process for the preparation of low-defect InP substrate crystals
Author
Müller, G. ; Hofmann, D. ; Schäfer, N.
Author_Institution
Inst. fuer Werkstoffwissenschaften, Erlangen-Nurnberg Univ., Germany
fYear
1993
fDate
19-22 Apr 1993
Firstpage
60
Lastpage
65
Abstract
The current status of LEC (liquid encapsulated Czochralski)-type growth processes and vertical gradient freeze (VGF)-growth of InP substrate crystals is reviewed. The twinning problem presently limiting the VGF potential is discussed and strategies to overcome this defect are considered. A new type of VGF multizone furnace is introduced. VGF processing under defined thermal and constitutional boundary conditions in this apparatus based on a recently developed global numerical model offers new perspectives for the growth of low-defect InP single crystals
Keywords
III-V semiconductors; crystal growth from melt; indium compounds; semiconductor growth; substrates; twinning; LEC type growth; VGF growth process; boundary conditions; global numerical model; growth; low-defect InP substrate crystals; multizone furnace; preparation; twinning problem; vertical gradient freeze; Boundary conditions; Crystalline materials; Crystals; Furnaces; Indium phosphide; Manufacturing processes; Numerical models; Raw materials; Temperature; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1993. Conference Proceedings., Fifth International Conference on
Conference_Location
Paris
Print_ISBN
0-7803-0993-6
Type
conf
DOI
10.1109/ICIPRM.1993.380710
Filename
380710
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