Title :
The impact of oxygen incorporation during the MBE growth of AlGaAs
Author :
RahmanOthman, A.A. ; Usher, B.F. ; Nelson, D.
Author_Institution :
Dept. of Electron. Eng., La Trobe Univ., Bundoora, VIC, Australia
Abstract :
This paper presents the results of a study of the effects of oxygen and nitrogen incorporation in AlxGa1-xAs epitaxial layers during MBE growth. Low level controlled air leaks were introduced during growth and the structural properties of the layers measured by HRXRD, while SIMS was used to measure the oxygen and nitrogen content in the layers. The AlxGa1-xAs lattice parameter exhibits contraction for Al fractions x up to 0.6 while layers with x fractions greater than 0.6 show an expansion in the AlxGa1-xAs lattice parameter. The observations are interpreted by comparing these lattice parameter measurements with AlxGa1-xAs layers grown without admitting air to the growth chamber. The x-fraction incorporation dependence, as well as the lattice parameter behavior, is accounted for by a model which discriminates between the propensities for O2 to incorporate at As sites by bonding to pairs of Ga atoms in the layer beneath, to one Al and one Ga in the layer beneath or to two Al atoms in the layer beneath. There is also evidence that the O2 and N2 molecules compete for these bonding sites.
Keywords :
III-V semiconductors; X-ray diffraction; aluminium compounds; gallium arsenide; lattice constants; molecular beam epitaxial growth; secondary ion mass spectra; semiconductor epitaxial layers; semiconductor growth; Al fraction contraction; AlxGa1-xAs epitaxial layers; AlxGa1-xAs lattice parameter; As sites; Ga atoms; HRXRD; MBE growth; O2 propensities; SIMS; air leaks; bonding sites; growth chamber; nitrogen incorporation; oxygen incorporation impact; secondary ion mass spectra; structural properties; x-fraction incorporation dependence; Gallium arsenide; Lattices; Mathematical model; Molecular beam epitaxial growth; Nitrogen; Semiconductor device measurement; Standards;
Conference_Titel :
Photonics (ICP), 2012 IEEE 3rd International Conference on
Conference_Location :
Penang
Print_ISBN :
978-1-4673-1461-9
DOI :
10.1109/ICP.2012.6379836