• DocumentCode
    2501669
  • Title

    Distribution of intermediates during removal of benzene from aqueous solutions by low energy electron beam

  • Author

    Peldszus, S. ; Lubicki, P. ; Andrews, S.A. ; Jayaram, S.

  • Author_Institution
    Dept. of Civil Eng., Waterloo Univ., Ont., Canada
  • fYear
    1998
  • fDate
    27-30 Sep 1998
  • Firstpage
    791
  • Lastpage
    794
  • Abstract
    This paper presents results from an experiment that utilizes a low energy electron beam apparatus for the removal of benzene from an aqueous solution. The configuration of the irradiator is briefly described, a significant detail of which is the use of boron nitride windows. Concentrations of benzene and its oxidation by-products including phenols, aldehydes and carboxylic acids were monitored throughout the experiment. No analysis was undertaken for by-products formed from reductive pathways. Phenolic intermediates were formed first followed by the development of organic acid intermediates. Aldehydes were only formed to a minor extent. All of these oxidation by-products together account for nearly 30% of the total organic carbon of the parent compound. However, at the time when benzene was degraded to non detect levels, intermediates were still present in significant amounts. These intermediates were detected in the following relative distribution: 90% were carboxylic acid intermediates, followed by phenols with 9% and aldehydes with 1%
  • Keywords
    electron beam effects; organic compounds; oxidation; radiolysis; solutions; water treatment; aldehyde; aqueous solution; benzene contaminant removal; boron nitride window; carboxylic acid; electron beam irradiation; intermediate distribution; oxidation by-product; phenol; water treatment; Boron; Chemicals; Chemistry; Circuits; Electron beams; Heating; Organic compounds; Oxidation; Thermal degradation; Water pollution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulating Materials, 1998. Proceedings of 1998 International Symposium on
  • Conference_Location
    Toyohashi
  • Print_ISBN
    4-88686-050-8
  • Type

    conf

  • DOI
    10.1109/ISEIM.1998.741866
  • Filename
    741866