Title :
Infrared luminescence of erbium-silicon-oxide crystalline compound on silicon
Author :
Ishiyama, T. ; Higuchi, M. ; Obata, T. ; Kamiura, Y.
Author_Institution :
Dept. of Electr. & Electron. Inf., Toyohashi Univ. of Technol., Toyohashi, Japan
Abstract :
The photoluminescence (PL) properties of crystalline Er-Si-O compound on silicon substrate prepared using a simple method through evaporation and thermal annealing have been investigated. Diffraction peaks corresponding to crystalline Er-Si-O were clearly detected in X-ray diffraction measurements. Er-related infrared luminescence was observed at around 1.52 μm at room temperature. This luminescence of the crystalline Er-Si-O compound on Si was due not to direct excitation of the 4f shell of Er3+, but to excitation of the host Si, i.e. indirect excitation. The observed luminescence was very intense compared with that of a sample prepared by a wet-chemical method using ErCl3. The Er-related PL spectra also showed several peaks at room temperature, which reflected the splitting patterns of ground manifolds (4I15/2) for the 4f11 shell of Er3+. Significant differences in peak wavelengths between the crystalline Er-Si-O compound on Si substrate and Er-doped Si on Si substrate (Si:Er:O/Si) grown by molecular beam epitaxy were observed in the PL spectra at 77 K. In addition, temperature quenching of Er-related infrared luminescence was greatly reduced in the crystalline Er-Si-O compound prepared using the simple method. Finally, a new electron spin resonance spectrum was detected for the crystalline Er-Si-O compound on silicon substrate, thought to be related to the presence of Er atoms in the compound.
Keywords :
X-ray diffraction; annealing; erbium; evaporation; infrared spectra; molecular beam epitaxial growth; paramagnetic resonance; photoluminescence; quenching (thermal); silicon; silicon compounds; Er-SiO; Er-doped Si; Er-related infrared luminescence; Si:Er; X-ray diffraction measurements; crystalline Er-Si-O compound; electron spin resonance; erbium-silicon-oxide crystalline compound; evaporation; ground manifolds; indirect excitation; molecular beam epitaxy; photoluminescence properties; silicon substrate; splitting patterns; temperature 293 K to 298 K; temperature 77 K; temperature quenching; thermal annealing; wet-chemical method; Annealing; Compounds; Erbium; Luminescence; Silicon; Substrates; Temperature measurement;
Conference_Titel :
Photonics (ICP), 2012 IEEE 3rd International Conference on
Conference_Location :
Penang
Print_ISBN :
978-1-4673-1461-9
DOI :
10.1109/ICP.2012.6379863