• DocumentCode
    2503952
  • Title

    A study of plated through-hole reliability of formaldehyde-based electroless copper depositions

  • Author

    Sleboda, Thomas

  • Author_Institution
    Motorola Inc., Austin, TX, USA
  • fYear
    1996
  • fDate
    14-16 Oct 1996
  • Firstpage
    182
  • Lastpage
    189
  • Abstract
    With the growth of electroless depositions, the need to understand the formaldehyde-based electroless plating process in multi-layer board (MLB) applications is becoming increasingly important. The purpose of this work is to understand the conditions that insure reliable, crack-free electroless copper in plated through-holes (PTHs). This is accomplished by correlating multiple processing and plating variables to PTH cracking in actual MLBs. A design of experiment (DOE) and statistical analysis was employed to understand the most important processing and plating conditions on PTH cracking. It was found that cracking is not only affected by plating thickness and PTH diameter, but also by plating bath variables such as formaldehyde (HCHO) concentration. These results indicate that a strict adherence to plating bath concentrations had the largest effect on insuring crack-free PTHs. In addition, the microstructure of the electroless copper foils in this experiment was analyzed and correlated to cracking. It was found that the copper from the PTHs with more cracking had voids in the microstructure, believed to originate from hydrogen evolution, increased dimpling and less plastic deformation in the region of the fracture surface from elevated temperature (250°C) tensile testing
  • Keywords
    circuit reliability; copper; design of experiments; electroless deposition; printed circuit manufacture; statistical analysis; 250 C; Cu; copper foil; cracking; design of experiment; dimpling; electroless deposition; elevated temperature tensile testing; formaldehyde concentration; fracture surface; hydrogen evolution; microstructure; multilayer board; plastic deformation; plated through-hole reliability; statistical analysis; void; Biographies; Chemistry; Copper; Metallization; Microprocessors; Microstructure; Packaging; Reliability engineering; Substrates; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Manufacturing Technology Symposium, 1996., Nineteenth IEEE/CPMT
  • Conference_Location
    Austin, TX
  • ISSN
    1089-8190
  • Print_ISBN
    0-7803-3642-9
  • Type

    conf

  • DOI
    10.1109/IEMT.1996.559725
  • Filename
    559725