Title :
A new write head trimmed at wafer level by focused ion beam
Author :
Koshikawa, Takanori ; Nagai, Akihiko ; Yokoyama, Yoshisato ; Hoshino, Takashi
Author_Institution :
Fujitsu Ltd.
Keywords :
Degradation; Etching; Fabrication; Inductance; Ion beams; Magnetic heads; Manufacturing; Protection; Spin valves; Transistors;
Conference_Titel :
MMM-Intermag Conference, 1998. Abstracts., The 7th Joint
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-5118-5
DOI :
10.1109/INTMAG.1998.742081
