DocumentCode :
2505195
Title :
Improvements in InP solar cells
Author :
Keavney, Christopher ; Vernon, Stanley M. ; Haven, Victor E.
Author_Institution :
Spire Corp., Bedford, MA, USA
fYear :
1988
fDate :
1988
Firstpage :
654
Abstract :
Indium phosphide solar cells with very thin n-type emitters have been made by both ion implantation and metal-organic chemical vapor deposition. Air mass zero efficiencies as high as 18.8% (NASA measurement) have been achieved. The best cells, which were those made by ion implantation, show an open-circuit voltage of 873 mV, short-circuit current of 35.7 mA/cm2, and fill factor of 0.829. Improvements are anticipated in all three of these parameters. Internal quantum efficiency peaks at over 90% in the red end of the spectrum, but drops to 54% in the blue end. Other cells have achieved 74% in the blue end. A preliminary investigation of InP solar cells on foreign substrates has been carried out. Although problems have been encountered with doping of the InP by the substrate, cells of 7.1% efficiency on silicon and cells of 9.4%, efficiency on GaAs have been made.
Keywords :
CVD coatings; III-V semiconductors; indium compounds; ion implantation; semiconductor growth; semiconductor thin films; solar cells; 7.1 percent; 9.4 percent; GaAs; InP solar cells; Si; air mass zero efficiencies; doping; fill factor; ion implantation; metal-organic chemical vapor deposition; open-circuit voltage; quantum efficiency; semiconductor; short-circuit current; thin n-type emitters; Annealing; Chemical vapor deposition; Doping; Gallium arsenide; Indium phosphide; Ion implantation; MOCVD; NASA; Photovoltaic cells; Silicon; Substrates; Voltage; Zinc;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1988., Conference Record of the Twentieth IEEE
Conference_Location :
Las Vegas, NV, USA
Type :
conf
DOI :
10.1109/PVSC.1988.105784
Filename :
105784
Link To Document :
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