Title :
Classification of astrocytomas and oligodendrogliomas from mass spectrometry data using sparse kernel machines
Author :
Huang, Jacob ; Gholami, Behnood ; Agar, Nathalie Y R ; Norton, Isaiah ; Haddad, Wassim M. ; Tannenbaum, Allen R.
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fDate :
Aug. 30 2011-Sept. 3 2011
Abstract :
Glioma histologies are the primary factor in prognostic estimates and are used in determining the proper course of treatment. Furthermore, due to the sensitivity of cranial environments, real-time tumor-cell classification and boundary detection can aid in the precision and completeness of tumor resection. A recent improvement to mass spectrometry known as desorption electrospray ionization operates in an ambient environment without the application of a preparation compound. This allows for a real-time acquisition of mass spectra during surgeries and other live operations. In this paper, we present a framework using sparse kernel machines to determine a glioma sample´s histopathological subtype by analyzing its chemical composition acquired by desorption electrospray ionization mass spectrometry.
Keywords :
biochemistry; brain; cancer; cellular biophysics; desorption; ionisation; mass spectroscopic chemical analysis; medical computing; molecular biophysics; patient diagnosis; sparse matrices; support vector machines; surgery; tumours; astrocytoma; boundary detection; chemical composition; cranial environment; desorption electrospray ionization mass spectrometry; glioma histology; histopathological subtype; oligodendroglioma; patient treatment; prognostic estimates; sparse kernel machine; surgery; tumor resection; tumor-cell classification; Accuracy; Cancer; Ionization; Kernel; Mass spectroscopy; Support vector machines; Tumors; Algorithms; Astrocytoma; Humans; Oligodendroglioma; Spectrometry, Mass, Electrospray Ionization;
Conference_Titel :
Engineering in Medicine and Biology Society, EMBC, 2011 Annual International Conference of the IEEE
Conference_Location :
Boston, MA
Print_ISBN :
978-1-4244-4121-1
Electronic_ISBN :
1557-170X
DOI :
10.1109/IEMBS.2011.6091964