DocumentCode

2506166

Title

Chemical Polishing in Etching Solutions That Contain Surfactants

Author

Brandmayr, Ronald J. ; Vig, John R.

fYear

1985

fDate

29-31 May 1985

Firstpage

276

Lastpage

281

Keywords

Chemical processes; Chemical technology; Crystals; Etching; Frequency; Hafnium; Laboratories; Resists; Surface cleaning; Surface contamination;

fLanguage

English

Publisher

ieee

Conference_Titel

39th Annual Symposium on Frequency Control. 1985

Conference_Location

Philadelphia, Pennsylvania, USA

Type

conf

DOI

10.1109/FREQ.1985.200857

Filename

1537797