DocumentCode :
2506207
Title :
Characterization of a body-tied vertical MOSFET
Author :
Lu, Kuan-Yu ; Lin, Jyi-Tsong ; Eng, Yi-Chuen ; Tai, Chih-Hsuan ; Chen, Cheng-Hsin ; Chang, Yu-Che ; Fan, Yi-Hsuan
Author_Institution :
Dept. of Electr. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
fYear :
2010
fDate :
10-11 May 2010
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, a non-classical body-tied vertical field-effect transistor (BTVFET) utilizing the self-aligned technique is presented and demonstrated. Based on the simulations, we find out that the electrical characteristics of the BTVFET are better than that of the conventional SOI VFET, including the outstanding ability of heat dissipation, higher channel mobility, lower parasitic capacitance, and reduced gate leakage current. The excellent subthreshold swing (~77 mV/dec) of the BTVFET is also attractive. In addition, the shallow junction is easy to form because the partially insulating oxide is under the drain regions in our proposed quasi-SOI vertical MOSFET. Hence, it is believed that the BTVFET can become one of the candidates for future CMOS scaling.
Keywords :
MOSFET; cooling; CMOS scaling; body-tied vertical MOSFET; body-tied vertical field-effect transistor; channel mobility; gate leakage current; heat dissipation; parasitic capacitance; CMOS technology; Etching; FETs; Fabrication; Insulation; Leakage current; Lithography; MOSFET circuits; Parasitic capacitance; Silicon on insulator technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Junction Technology (IWJT), 2010 International Workshop on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5866-0
Type :
conf
DOI :
10.1109/IWJT.2010.5474896
Filename :
5474896
Link To Document :
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