DocumentCode
2506289
Title
Etch Processing of Bulk and Surface Wave Devices
Author
Dowsett, John ; Dwyer, Douglas F G ; Stern, Francesca ; Heinecke, R.A. ; Truelove, A.H.
fYear
1985
fDate
29-31 May 1985
Firstpage
301
Lastpage
310
Keywords
Chemical technology; Crystalline materials; Etching; Plasma applications; Plasma devices; Plasma materials processing; Plasma waves; Production; Surface waves; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
39th Annual Symposium on Frequency Control. 1985
Conference_Location
Philadelphia, Pennsylvania, USA
Type
conf
DOI
10.1109/FREQ.1985.200860
Filename
1537800
Link To Document