Title :
Vacuum microelectronics
Author :
Greene, R.F. ; Gray, H. ; Spindt, C.
Author_Institution :
North Carolina Univ., Charlotte, NC, USA
Abstract :
An overview of the progress, problems, and potential of vacuum microelectronics is presented. Particular attention is given to fabrication processes. It is emphasized that vacuum microelectronics represents a promising field with many potential applications niches (i.e. with intrinsic advantages over other technologies), rather than a single great revolution comparable to that of silicon. Important research problems that remain and potential applications are discussed.<>
Keywords :
vacuum microelectronics; applications niches; fabrication processes; research problems; vacuum microelectronics; Costs; Current density; Electron sources; Fabrication; Field emitter arrays; Microelectronics; Silicon; Solid state circuits; Temperature; Vacuum technology;
Conference_Titel :
Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-0817-4
DOI :
10.1109/IEDM.1989.74219
