DocumentCode
2506487
Title
Vacuum microelectronics
Author
Greene, R.F. ; Gray, H. ; Spindt, C.
Author_Institution
North Carolina Univ., Charlotte, NC, USA
fYear
1989
fDate
3-6 Dec. 1989
Firstpage
15
Lastpage
19
Abstract
An overview of the progress, problems, and potential of vacuum microelectronics is presented. Particular attention is given to fabrication processes. It is emphasized that vacuum microelectronics represents a promising field with many potential applications niches (i.e. with intrinsic advantages over other technologies), rather than a single great revolution comparable to that of silicon. Important research problems that remain and potential applications are discussed.<>
Keywords
vacuum microelectronics; applications niches; fabrication processes; research problems; vacuum microelectronics; Costs; Current density; Electron sources; Fabrication; Field emitter arrays; Microelectronics; Silicon; Solid state circuits; Temperature; Vacuum technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
Conference_Location
Washington, DC, USA
ISSN
0163-1918
Print_ISBN
0-7803-0817-4
Type
conf
DOI
10.1109/IEDM.1989.74219
Filename
74219
Link To Document