• DocumentCode
    2506587
  • Title

    Laser spike anneal macro & micro non-uniformity investigation using modulated optical reflectance and four-point-probe

  • Author

    He, Yonggen ; Chen, Yong ; Yu, Guobin ; Hong, Albert ; Lu, Jiong-Ping ; Liu, Xianghua ; Yu, Lu ; Chen, Yue

  • Author_Institution
    Technol. R&D center, Semicond. Manuf. Int. Corp., Shanghai, China
  • fYear
    2010
  • fDate
    10-11 May 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Laser spike anneal (LSA) is one of major millisecond anneal techniques for forming ultra-shallow and highly activated junctions. With its ultra-fast heating capability, LSA has found a range of applications in ultra-shallow junction (USJ) applications. However, there are some challenges associated with the technique that need to be effectively addressed to ensure the quality of LSA processes. One of such challenges is macro and micro non-uniformity resulted from LSA process. In this work, the non-uniformity was studied using modulated optical reflectance (MOR) and sheet resistance measurement by four point probe. Significant macro and micro non-uniformity was observed through these metrologies. The impact of LSA process knobs, such as scanning method, overlap percentage and rotation on non-uniformity was investigated.
  • Keywords
    laser beam annealing; semiconductor junctions; LSA process; four point probe; highly activated junction; laser spike anneal; macro nonuniformity; micro nonuniformity; millisecond anneal technique; modulated optical reflectance; nonuniformity rotation; overlap percentage; scanning method; sheet resistance measurement; ultra-fast heating capability; ultra-shallow junction; Annealing; Boron; Germanium silicon alloys; Optical modulation; Partial response channels; Probes; Reflectivity; Semiconductor lasers; Silicon germanium; Strips;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology (IWJT), 2010 International Workshop on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5866-0
  • Type

    conf

  • DOI
    10.1109/IWJT.2010.5474916
  • Filename
    5474916