DocumentCode :
25073
Title :
Modeling, Fabrication, and Characterization of Piezoelectric Micromachined Ultrasonic Transducer Arrays Based on Cavity SOI Wafers
Author :
Yipeng Lu ; Horsley, David A.
Author_Institution :
Berkeley Sensor & Actuator Center, Univ. of California at Davis, Davis, CA, USA
Volume :
24
Issue :
4
fYear :
2015
fDate :
Aug. 2015
Firstpage :
1142
Lastpage :
1149
Abstract :
This paper presents high fill-factor piezoelectric micromachined ultrasonic transducer (PMUT) arrays fabricated via a novel process using cavity SOI wafers. The simple three-mask fabrication process enables smaller diameter PMUTs (25 μm) and finer pitch than previous processes requiring through-wafer etching. PMUTs were fabricated with diameters from 25 to 50 μm, resulting in center frequencies from 13 to 55 MHz in air. Two types of devices, having different piezoelectric layers, lead zirconium titanate (PZT), and aluminum nitride (AlN), were fabricated and characterized. Comparing 50-μm diameter devices, the PZT PMUTs show large dynamic displacement sensitivity of 316 nm/V at 11 MHz in air, which is ~20x higher than that of the AlN PMUTs. Electrical impedance measurements of the PZT PMUTs show high electromechanical coupling k2t = 12.5% and 50-Ω electrical impedance that is well-matched to typical interface circuits. Immersion tests were conducted on PZT PMUT arrays. The fluid-immersed acoustic pressure generated by an unfocused 9 × 9 array of 40-μm diameter, 10-MHz PZT PMUTs, measured with a needle hydrophone 1.2 mm away from the array, was 58 kPa with a 25 Vpp input. Beam forming based on electronic phase control produced a narrow, 150-μm diameter, focused beam over a depth of focus >0.2 mm and increased the pressure to 450 kPa with 18 Vpp input.
Keywords :
aluminium compounds; coupled circuits; electric impedance measurement; etching; lead compounds; masks; micromachining; phase control; piezoelectric transducers; semiconductor technology; silicon-on-insulator; titanium compounds; ultrasonic transducer arrays; zirconium compounds; AlN; PZT PMUT array; aluminum nitride; beam forming; cavity SOI wafer; center frequency; dynamic displacement sensitivity; electrical impedance measurement; electromechanical coupling; electronic phase control; fill-factor; fluid-immersed acoustic pressure; frequency 11 MHz; frequency 13 MHz to 55 MHz; immersion test; lead zirconium titanate; needle hydrophone; piezoelectric micromachined ultrasonic transducer array; pressure 58 kPa; three-mask fabrication process; through-wafer etching; Cavity resonators; Electrodes; Fabrication; III-V semiconductor materials; Sensitivity; Silicon; Stress; AlN; PMUT; PZT; cavity SOI; cavity SOI.; micromachined transducers; piezoelectric; ultrasound transducers;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2014.2387154
Filename :
7014229
Link To Document :
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