Title :
Interest of 0.15 μm gate length InGaAs/InP composite channel HEMTs for millimeter-wave MMIC amplifiers
Author :
Chevalier, P. ; Dessenne, F. ; Badirou, M. ; Thobel, J.L. ; Fauquembergue, R.
Author_Institution :
Inst. d´´Electron. et de Microelectron. du Nord, CNRS, Villeneuve d´´Ascq, France
Abstract :
This paper outlines the use of an InGaAs/InP channel allows to reduce drastically impact ionisation effects and consequently output conductance of the device: 85 mS/mm for a composite channel compared to 145 mS/mm for the conventional channel. Using a composite channel, device transconductance is enhanced from 1 S/mm to 1.2 S/mm and cut-off frequency FMAX increases by 50%. Thus a 0.15 μm gate length InGaAs/lnP composite channel HEMT shows a current gain cut-off frequency FT of 151 GHz and a maximum unilateral gain cut-off frequency FMAX of 225 GHz. The comparison of passivated and non-passivated devices highlights the influence of the feedback capacitance on RF performance. 0.15 μm gate length InGaAs/InP/InP n+ composite channel HEMTs have also been fabricated. Devices exhibit state of the art performance at 60 GHz, with an output power density of 350 mW/mm, 12% power-added-efficiency (PAE) and 6.2 dB of linear gain
Keywords :
HEMT integrated circuits; III-V semiconductors; MMIC amplifiers; capacitance; field effect MIMIC; gallium arsenide; impact ionisation; indium compounds; integrated circuit technology; millimetre wave amplifiers; passivation; 0.15 micron; 1.2 S/mm; 12 percent; 6.2 dB; 60 to 225 GHz; 85 mS/mm; EHF; InGaAs-InP; InGaAs/InP composite channel HEMTs; MIMIC; feedback capacitance; impact ionisation effects; millimeter-wave MMIC amplifiers; nonpassivated devices; output conductance; passivated devices; Capacitance; Cutoff frequency; Feedback; HEMTs; Impact ionization; Indium gallium arsenide; Indium phosphide; Power generation; Radio frequency; Transconductance;
Conference_Titel :
High Performance Electron Devices for Microwave and Optoelectronic Applications, 1997. EDMO. 1997 Workshop on
Conference_Location :
London
Print_ISBN :
0-7803-4135-X
DOI :
10.1109/EDMO.1997.668598