Title :
High selectivity and wide stop band silicon BPF
Author :
Singh, Kamaljeet ; Balasubramanyam, D. ; Nagachenchaiah, K.
Author_Institution :
Semicond. Lab. (SCL), Chandigarh
Abstract :
In this article, design and development of band pass filter at X-band with the FBW of ~ 4% on silicon substrate has been presented using the dual-behavior resonator (DBR) approach. The proposed topology uses single section coupled lines to maintain the compactness and can be easily realizable with the standard microwave integrated circuit fabrication techniques. The designed filter shows high selectivity at upper band and wider stops band characteristics. The insertion loss better than 3.5 dB and return loss better than 12 dB are achieved at center frequency of 8 GHz using high resistivity silicon substrate.
Keywords :
band-pass filters; elemental semiconductors; microwave filters; microwave integrated circuits; network topology; resonators; silicon; Si; band pass filter; circuit topology; dual-behavior resonator; frequency 8 GHz; microwave integrated circuit fabrication techniques; wide stop band BPF; Band pass filters; Circuit topology; Coupling circuits; Distributed Bragg reflectors; Fabrication; Microwave filters; Microwave integrated circuits; Microwave theory and techniques; Resonator filters; Silicon; Band pass filter; Dual-behavior resonator (DBR); High resistivity wafer; Parallel coupled line (PCL);
Conference_Titel :
Recent Advances in Microwave Theory and Applications, 2008. MICROWAVE 2008. International Conference on
Conference_Location :
Jaipur
Print_ISBN :
978-1-4244-2690-4
Electronic_ISBN :
978-1-4244-2691-1
DOI :
10.1109/AMTA.2008.4762980