Title :
Solar cell manufacturing technology in Japan
Author :
Kobayashi, T. ; Kimura, M. ; Kato, Y. ; Amano, S. ; Nakashima, Y. ; Yoshikawa, S. ; Sugimoto, H.
Author_Institution :
Minist. of Int. Trade & Ind., Tokyo, Japan
Abstract :
Achievements and future projects in the fields of polycrystalline and amorphous silicon solar cell manufacturing technologies in Japan are discussed. The target and status of poly-Si solar cell developments in the areas of silicon materials, cast wafers, sheet wafers, and cell fabrication are presented. The target and status of a-Si solar cell development in such areas as high-quality large-area cells, high-productivity low-cost transparent conductive films, and high reliability are also presented.
Keywords :
amorphous semiconductors; elemental semiconductors; silicon; solar cells; Japan; Si; a-Si solar cell; cast wafers; cell fabrication; high reliability; high-quality large-area cells; low-cost transparent conductive films; manufacturing technology; poly-Si solar cell; semiconductor; sheet wafers; solar cells; Amorphous silicon; Conducting materials; Conductive films; Costs; Fabrication; Fluidization; Inductors; International trade; Manufacturing; Manufacturing industries; Photovoltaic cells; Production; Research and development; Sheet materials; Solar power generation;
Conference_Titel :
Photovoltaic Specialists Conference, 1988., Conference Record of the Twentieth IEEE
Conference_Location :
Las Vegas, NV, USA
DOI :
10.1109/PVSC.1988.105929
