• DocumentCode
    2511439
  • Title

    RF Reactively Sputtered Aluminum Nitride Thin Films

  • Author

    Kumar, N. ; Pourrezaei, K. ; Singh, B. ; DeMaria, R.J.

  • fYear
    1986
  • fDate
    8-11 June 1986
  • Firstpage
    86
  • Lastpage
    88
  • Keywords
    Aluminum nitride; Argon; Nitrogen; Piezoelectric films; Plasma temperature; Radio frequency; Semiconductor films; Silicon; Sputtering; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics. 1986 Sixth IEEE International Symposium on
  • Conference_Location
    Bethlehem, PA, USA
  • Type

    conf

  • DOI
    10.1109/ISAF.1986.201101
  • Filename
    1538041
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2511439