DocumentCode :
2512255
Title :
Modelling of the influence of dislocations on effective diffusion length and photocurrent of polycrystalline silicon cells
Author :
El Ghitani, H. ; Martinuzzi, S.
Author_Institution :
Lab. de Photoelectr. des Semi-conducteurs, Marseille Univ., France
fYear :
1988
fDate :
1988
Firstpage :
1624
Abstract :
Green´s function is used to establish a three-dimensional model to obtain a detailed rigorous analytical expression of the effect of dislocations. The predictions of the model were verified by measuring the photocurrent, the spectral response, and the effective diffusion lengths of minority carriers (Leff) and by evaluating the dislocation etch pit density. Three materials are considered, POLYX, SILSO, and SEMIX, which differ by the value of the diffusion length (Ln) in the homogeneous regions of the bulk. It is found that the values of Jsc and Leff are dependent on Ndis and Sd provided they are greater than 104 cm-2 and 104 cm-s-1, respectively. The computed variations also depend on the value of the diffusion length in the homogeneous region of the bulk material. A reasonable agreement is found with experimental results obtained with large-grained polycrystalline materials such as SILSO and POLYX.
Keywords :
Green´s function methods; carrier lifetime; dislocation density; dislocation etching; elemental semiconductors; minority carriers; photoconductivity; semiconductor device models; silicon; solar cells; Green´s function; POLYX; SEMIX; SILSO; Si; diffusion length; dislocation etch pit density; minority carriers; photocurrent; polycrystalline silicon cells; semiconductor; spectral response; three-dimensional model; Density measurement; Etching; Grain boundaries; Grain size; Green´s function methods; Length measurement; P-n junctions; Photoconductivity; Photovoltaic cells; Photovoltaic systems; Predictive models; Silicon; Space charge; Surface resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1988., Conference Record of the Twentieth IEEE
Conference_Location :
Las Vegas, NV, USA
Type :
conf
DOI :
10.1109/PVSC.1988.105987
Filename :
105987
Link To Document :
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