The Development of the Dry Cleaning and Surface Treatment All-in-one Equipment Used for Biochip

The surface treatment and cleaning for biochips has been a long existing problem to the biological scientists. We provided a fast, reliable and low cost method to solve this difficulty. We proposed a method using a high density hot Ozone vapor to clean the organic pollutant on the slide surface. Further, we added a Chemical Vapor Deposit system (CVD) in the operating chamber to process the surface energy treatment with the biochips. In this way, the hydrophilic or hydrophobic character of biochip surface could be controlled. A nozzle of CVD system is a long metal capillary needle used to inject chemistry liquid into the reaction chamber directly. Different from the common CVD systems, we used the chemical vapor guiding pipe, so there is no liquid jam in the guiding pipe. Moreover, we can get a high quality coated thin film by steaming the hot vapor to the slides in a sealed vessel without any vacuum equipment. The features of this system are fast, low cost, and easy to be operated. All processes are completely integrated in one chamber. The producing period of the biochips may be reduced from ten hours to one hour.