DocumentCode
2513556
Title
Device Characteristics of Ferroelectric Ceramic KNO3 Thin-Film Raw Memories
Author
Scott, J.F. ; Godfrey, R.B. ; Araujo, C.A. ; McMillan, L.D. ; Meadows, H.Brett ; Golabi, Manooch
fYear
1986
fDate
8-11 June 1986
Firstpage
569
Lastpage
571
Keywords
Ceramics; Fatigue; Ferroelectric materials; Logic devices; Material storage; Nonvolatile memory; Thin film devices; Timing; Very large scale integration; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics. 1986 Sixth IEEE International Symposium on
Conference_Location
Bethlehem, PA, USA
Type
conf
DOI
10.1109/ISAF.1986.201207
Filename
1538147
Link To Document