DocumentCode
2513831
Title
Fast and concurrent simulations for SI, PI, and EMI analysis of multilayer printed circuit boards
Author
Duan, Xiaomin ; Rimolo-Donadio, Renato ; Brüns, Heinz-Dietrich ; Schuster, Christian
Author_Institution
Inst. fur Theor. Elektrotechnik, Tech. Univ. Hamburg-Harburg, Hamburg, Germany
fYear
2010
fDate
12-16 April 2010
Firstpage
614
Lastpage
617
Abstract
In previous work of the authors, a hybridization of four efficient techniques, namely the physics-based via model, the modal decomposition technique, the contour integral method, and the field equivalence principle, has been proposed for fast and concurrent analysis of signal integrity (SI), power integrity (PI), and electromagnetic interference (EMI) effects on printed circuit boards (PCBs). This paper focuses on the application of the method to simulate multilayer PCBs. An application example is demonstrated and the results with respect to SI, PI and EMI analysis, including S-parameter, field distributions between power planes, as well as radiated power, are discussed. Full-wave simulation results are also provided for comparison and validation. It is shown that the combined method is more than one hundred times faster than general purpose full-wave solvers.
Keywords
electromagnetic interference; printed circuits; EMI analysis; S-parameter; contour integral method; electromagnetic interference effects; field distributions; field equivalence principle; full-wave simulation; general purpose full-wave solvers; modal decomposition technique; multilayer PCB simulation; multilayer printed circuit boards; physics-based via model; power integrity analysis; power planes; signal integrity concurrent simulations; Analytical models; Circuit simulation; Crosstalk; Electromagnetic analysis; Electromagnetic compatibility; Electromagnetic interference; Impedance; Nonhomogeneous media; Printed circuits; Signal analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Electromagnetic Compatibility (APEMC), 2010 Asia-Pacific Symposium on
Conference_Location
Beijing
Print_ISBN
978-1-4244-5621-5
Type
conf
DOI
10.1109/APEMC.2010.5475683
Filename
5475683
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