DocumentCode :
2514570
Title :
Lateral asymmetry in silicon MOSFETs: A new path to improve their microwave noise performance
Author :
Danneville, F. ; Lim, T.C. ; Dambrine, G.
Author_Institution :
CNRS, IEMN, Villeneuve-d´´Ascq
fYear :
2008
fDate :
21-24 Nov. 2008
Firstpage :
297
Lastpage :
298
Abstract :
Field effect transistors feature outstanding noise performance, and one of the fundamental reason being that the (input) gate noise is partially subtracted to the (output) drain noise. If III-V HEMTs strongly take benefit of this unique property, this is not the case for classical Si MOSFETs owing symmetric channel (SY-MOSFETs). In order to overcome this limitation, a new path to improve microwave noise performance of Si MOSFETs -through the use of laterally asymmetric channel- is proposed in this paper. The strong interest of these ldquoLAC-MOSFETsrdquo for low noise/low power applications is shown through a benchmarking of their noise properties/performances with SY-MOSFET and III-V pHEMTs.
Keywords :
MOSFET; elemental semiconductors; low-power electronics; microwave field effect transistors; semiconductor device noise; silicon; Si; field effect transistor; lateral asymmetric channel; low noise applications; low power applications; microwave noise performance; silicon MOSFET; CMOS technology; Capacitance; FETs; MOSFETs; Noise figure; Noise measurement; Optimized production technology; Performance gain; Radio frequency; Silicon; Intrinsic noise correlation coefficient (C); laterally asymmetric channel (LAC-MOSFET); minimum noise figure (NFMIN);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Recent Advances in Microwave Theory and Applications, 2008. MICROWAVE 2008. International Conference on
Conference_Location :
Jaipur
Print_ISBN :
978-1-4244-2690-4
Electronic_ISBN :
978-1-4244-2691-1
Type :
conf
DOI :
10.1109/AMTA.2008.4763246
Filename :
4763246
Link To Document :
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