Title :
Millimeter wave micromachined antenna development
Author :
Koul, Shiban Kishen
Author_Institution :
Centre for Appl. Res. in Electron., Indian Inst. of Technol. Delhi, Delhi
Abstract :
In this paper, design and modeling of different types of micromachined patch antennas are described. After initial design, these antenna geometries are optimized using commercial software tools and then fabricated on high resistivity silicon wafers. To start with, a thin dielectric film of silicon nitride or silicon dioxide is deposited on silicon substrates by radio frequency (RF) sputtering. After patterning the antenna conductor on top of the dielectric film, the dielectric membrane is released using bulk-micromachining technique. These antennas are then assembled on a special test jig with K-connectors and tested for their performance characteristics. The measured characteristics of a millimeter wave micromachined circular patch antenna realized on 270 mum thick silicon substrate.
Keywords :
antenna radiation patterns; dielectric thin films; micromachining; microstrip antennas; millimetre wave antennas; silicon compounds; sputter deposition; K-connectors; RF sputtering; Si; SiN; SiO2; antenna assembling; antenna conductor; antenna measured characteristics; antennas radiation efficiency; bulk-micromachining technique; commercial software tools; dielectric membrane; high resistivity silicon wafers; millimeter wave micromachined antenna design; optimized antenna geometries; radio frequency sputtering; silicon dioxide deposition; silicon nitride deposition; size 270 mum; test jig; thick silicon substrate; thin dielectric film; Dielectric films; Dielectric substrates; Geometry; Millimeter wave measurements; Millimeter wave technology; Patch antennas; Radio frequency; Semiconductor device modeling; Silicon; Testing;
Conference_Titel :
Recent Advances in Microwave Theory and Applications, 2008. MICROWAVE 2008. International Conference on
Conference_Location :
Jaipur
Print_ISBN :
978-1-4244-2690-4
Electronic_ISBN :
978-1-4244-2691-1
DOI :
10.1109/AMTA.2008.4763271