Title :
Automated reticle handling: a comparison of distributed and centralized reticle storage and transport
Author :
Murray, Anne M. ; Miller, David J.
Author_Institution :
IBM Microelectron., Hopewell Junction, NY, USA
Abstract :
The implementation of automated material handling systems (AMHS) in 300 mm semiconductor facilities provides the opportunity to realize significant benefits in fabricator productivity and performance. The leverage associated with automated reticle delivery to photolithography process tools may be less apparent than a fab-wide AMHS. However, a high product mix environment requires the tracking, storage and transportation of thousands of reticles to successfully process wafers on photolithography tools. The failure to deliver reticles in an accurate and timely manner will negate many of the competitive advantages associated with automated wafer handling. Implementing an automated reticle management system (ARMS) requires an evolution from traditional reticle storage and management methodologies. We review the application of simulation analysis to explore centralized versus distributed reticle storage and handling alternatives for an overall ARMS strategy.
Keywords :
integrated circuit manufacture; materials handling; photolithography; reticles; 300 mm; automated reticle management system; automated wafer handling; centralized reticle storage; distributed reticle storage; photolithography process tool; semiconductor facility; simulation analysis; Analytical models; Arm; Costs; Investments; Lithography; Material storage; Materials handling; Microelectronics; Productivity; Storage automation;
Conference_Titel :
Simulation Conference, 2003. Proceedings of the 2003 Winter
Print_ISBN :
0-7803-8131-9
DOI :
10.1109/WSC.2003.1261574