Title :
Superlens for lithography
Author :
Zhang, Yuan ; Zhang, Daohua ; Fiddy, Michael A.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
Abstract :
In this paper, we have examined the possibility of using a planar negative index lens in lithography applications.We numerically studied the field patterns generated by a PEC and Cr mask propagating through a negative index slab to form a super-resolved image of the mask at the image plane. We discuss the advantages and disadvantages of this for next generation lithography.
Keywords :
lenses; lithography; metamaterials; refractive index; PEC; lithography; perfect electrical conductor; planar negative index lens; superlens; superresolved image; Image resolution; Indexes; Lenses; Lithography; Metamaterials; Slabs; Surface waves; lithography; negative refraction; superlens;
Conference_Titel :
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4244-8393-8
Electronic_ISBN :
978-1-4244-8392-1
DOI :
10.1109/AOM.2010.5713599
