Title :
620 MHz AT-cut fundamental crystal resonator
Author :
Yamada, H. ; Ura, H. ; Fujiyama, H.
Author_Institution :
Kyushu Dentsu Co. Ltd., Nagasaki, Japan
Abstract :
This study succeeded in making 620 MHz AT-cut fundamental resonators, which used inverted mesa blanks of approximately 2.5 μm thickness, produced by a uniquely developed dry etching process using magnetron plasma. The electrode of this resonator is aluminum with has similar gravity to the crystal (2.65), and the blank is put into 7.5 mm×5.0 mm and 5.0 mm×3.2 mm ceramic packages. A voltage controlled crystal oscillator (VCXO) using this resonator shows excellent electrical characteristics.
Keywords :
UHF oscillators; ceramic packaging; crystal oscillators; crystal resonators; electrodes; plasma materials processing; sputter etching; voltage-controlled oscillators; 2.5 micron; 3.2 mm; 5 mm; 620 MHz; 7.5 mm; AT-cut fundamental crystal resonator; Al; SiO2; VCXO; aluminum electrode; ceramic package; electrical characteristics; electrode gravity; inverted mesa blanks; magnetron plasma dry etching process; voltage controlled crystal oscillator; Aluminum; Ceramics; Dry etching; Electrodes; Gravity; Packaging; Plasma applications; Plasma properties; Voltage control; Voltage-controlled oscillators;
Conference_Titel :
Frequency Control Symposium and PDA Exhibition, 2002. IEEE International
Print_ISBN :
0-7803-7082-1
DOI :
10.1109/FREQ.2002.1075875