DocumentCode :
2520491
Title :
620 MHz AT-cut fundamental crystal resonator
Author :
Yamada, H. ; Ura, H. ; Fujiyama, H.
Author_Institution :
Kyushu Dentsu Co. Ltd., Nagasaki, Japan
fYear :
2002
fDate :
2002
Firstpage :
174
Lastpage :
178
Abstract :
This study succeeded in making 620 MHz AT-cut fundamental resonators, which used inverted mesa blanks of approximately 2.5 μm thickness, produced by a uniquely developed dry etching process using magnetron plasma. The electrode of this resonator is aluminum with has similar gravity to the crystal (2.65), and the blank is put into 7.5 mm×5.0 mm and 5.0 mm×3.2 mm ceramic packages. A voltage controlled crystal oscillator (VCXO) using this resonator shows excellent electrical characteristics.
Keywords :
UHF oscillators; ceramic packaging; crystal oscillators; crystal resonators; electrodes; plasma materials processing; sputter etching; voltage-controlled oscillators; 2.5 micron; 3.2 mm; 5 mm; 620 MHz; 7.5 mm; AT-cut fundamental crystal resonator; Al; SiO2; VCXO; aluminum electrode; ceramic package; electrical characteristics; electrode gravity; inverted mesa blanks; magnetron plasma dry etching process; voltage controlled crystal oscillator; Aluminum; Ceramics; Dry etching; Electrodes; Gravity; Packaging; Plasma applications; Plasma properties; Voltage control; Voltage-controlled oscillators;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control Symposium and PDA Exhibition, 2002. IEEE International
Print_ISBN :
0-7803-7082-1
Type :
conf
DOI :
10.1109/FREQ.2002.1075875
Filename :
1075875
Link To Document :
بازگشت