DocumentCode
2520671
Title
Performance analysis of pixelated source-mask optimization for optical microlithography
Author
Jia, Ningning ; Lam, Edmund Y.
Author_Institution
Dept. of Electr. & Electron. Eng., Univ. of Hong Kong Pokfulam, Hong Kong, China
fYear
2010
fDate
15-17 Dec. 2010
Firstpage
1
Lastpage
4
Abstract
The optical lithography is facing great challenge from the continuous shrinkage of the technology node. As one of the promising techniques, the free-form source-mask optimization (SMO) has been increasingly explored in recent years with great interests in the performance of SMO on its process robustness. In this paper, a free-form SMO framework is proposed, and its performance is tested by comparing the process window of SMO and the mask-only optimization.
Keywords
masks; photolithography; free-form SMO framework; optical microlithography; pixelated source-mask optimization; process window; Lithography; Variable speed drives;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-9997-7
Type
conf
DOI
10.1109/EDSSC.2010.5713709
Filename
5713709
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