DocumentCode :
2521081
Title :
Body bias effect of GaN schottky barrier MOSFET with ITO source/drain
Author :
Lee, Chang-Ju ; Kim, Tae-Hyeon ; Kim, Dong-Seok ; Sung, Sang-Yun ; Jung, Byung-Kwon ; Young-Woo Heo ; Lee, Jung-Hee ; Hahm, Sung-Ho
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Kyungbook Nat. Univ., Daegu, South Korea
fYear :
2010
fDate :
15-17 Dec. 2010
Firstpage :
1
Lastpage :
4
Abstract :
We fabricated GaN SB-MOSFET using the ITO source/drain and gate with very high drain current and low threshold voltage. Furthermore, we tried to check the body bias effect of the GaN SB-MOSFET after forming the ohmic contact to the substrate. We could control threshold voltage by body bias that makes the device more useful. It is applicable to many of electric circuit applications such as logic gate, memory cell transistors, and image sensors, which are potential area for digital GaN UV optoelectronics.
Keywords :
III-V semiconductors; MOSFET; Schottky barriers; gallium compounds; ohmic contacts; wide band gap semiconductors; GaN; ITO source/drain; MOSFET; Schottky barrier; body bias effect; low threshold voltage; ohmic contact; very high drain current; Board of Directors; Logic gates; Radio frequency; Body bias; Gallium nitride (GaN); Indium-tin-oxide (ITO); MOSFET; Schottky barrier (SB);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-9997-7
Type :
conf
DOI :
10.1109/EDSSC.2010.5713729
Filename :
5713729
Link To Document :
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