DocumentCode
2521081
Title
Body bias effect of GaN schottky barrier MOSFET with ITO source/drain
Author
Lee, Chang-Ju ; Kim, Tae-Hyeon ; Kim, Dong-Seok ; Sung, Sang-Yun ; Jung, Byung-Kwon ; Young-Woo Heo ; Lee, Jung-Hee ; Hahm, Sung-Ho
Author_Institution
Sch. of Electr. Eng. & Comput. Sci., Kyungbook Nat. Univ., Daegu, South Korea
fYear
2010
fDate
15-17 Dec. 2010
Firstpage
1
Lastpage
4
Abstract
We fabricated GaN SB-MOSFET using the ITO source/drain and gate with very high drain current and low threshold voltage. Furthermore, we tried to check the body bias effect of the GaN SB-MOSFET after forming the ohmic contact to the substrate. We could control threshold voltage by body bias that makes the device more useful. It is applicable to many of electric circuit applications such as logic gate, memory cell transistors, and image sensors, which are potential area for digital GaN UV optoelectronics.
Keywords
III-V semiconductors; MOSFET; Schottky barriers; gallium compounds; ohmic contacts; wide band gap semiconductors; GaN; ITO source/drain; MOSFET; Schottky barrier; body bias effect; low threshold voltage; ohmic contact; very high drain current; Board of Directors; Logic gates; Radio frequency; Body bias; Gallium nitride (GaN); Indium-tin-oxide (ITO); MOSFET; Schottky barrier (SB);
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-9997-7
Type
conf
DOI
10.1109/EDSSC.2010.5713729
Filename
5713729
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