• DocumentCode
    2521081
  • Title

    Body bias effect of GaN schottky barrier MOSFET with ITO source/drain

  • Author

    Lee, Chang-Ju ; Kim, Tae-Hyeon ; Kim, Dong-Seok ; Sung, Sang-Yun ; Jung, Byung-Kwon ; Young-Woo Heo ; Lee, Jung-Hee ; Hahm, Sung-Ho

  • Author_Institution
    Sch. of Electr. Eng. & Comput. Sci., Kyungbook Nat. Univ., Daegu, South Korea
  • fYear
    2010
  • fDate
    15-17 Dec. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We fabricated GaN SB-MOSFET using the ITO source/drain and gate with very high drain current and low threshold voltage. Furthermore, we tried to check the body bias effect of the GaN SB-MOSFET after forming the ohmic contact to the substrate. We could control threshold voltage by body bias that makes the device more useful. It is applicable to many of electric circuit applications such as logic gate, memory cell transistors, and image sensors, which are potential area for digital GaN UV optoelectronics.
  • Keywords
    III-V semiconductors; MOSFET; Schottky barriers; gallium compounds; ohmic contacts; wide band gap semiconductors; GaN; ITO source/drain; MOSFET; Schottky barrier; body bias effect; low threshold voltage; ohmic contact; very high drain current; Board of Directors; Logic gates; Radio frequency; Body bias; Gallium nitride (GaN); Indium-tin-oxide (ITO); MOSFET; Schottky barrier (SB);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-9997-7
  • Type

    conf

  • DOI
    10.1109/EDSSC.2010.5713729
  • Filename
    5713729