Title :
Comparison of ion tuning and conventional finish plate for high frequency fundamental mode AT crystals
Author :
Morris, R. ; Carroll, B.
Author_Institution :
Connor Winfield Corp., Aurora, IL, USA
Abstract :
Despite the number of companies working on them, the manufacture of inverted mesa crystals in large quantities has remained a cumbersome and relatively expensive art. We discuss several of the unique challenges surrounding the final frequency adjustment of high frequency fundamental mode crystals. The focus will be on a comparison between recently developed ion tuning processes and conventional finish plating techniques for high frequency fundamental crystal applications. The topics discussed will range from the difficulties associated with minimizing electrical performance degradations through final tune to the observation of a "unique", persistent frequency drift after finish plating.
Keywords :
VHF devices; ageing; crystal resonators; frequency stability; sputter etching; tuning; vapour deposition; 155.52 MHz; HF fundamental mode AT crystals; VHF crystal resonators; aging; crystal final frequency adjustment; electrical performance degradation minimization; final tuning; finish plating techniques; high frequency crystals; inverted mesa crystal manufacture; ion tuning processes; tuning methods comparison; unique persistent frequency drift; Aging; Art; Capacitance; Crystalline materials; Crystals; Degradation; Frequency; Manufacturing; Monitoring; Tuning;
Conference_Titel :
Frequency Control Symposium and PDA Exhibition, 2002. IEEE International
Print_ISBN :
0-7803-7082-1
DOI :
10.1109/FREQ.2002.1075916