• DocumentCode
    2521975
  • Title

    Low-stress polyimide resin for IC

  • Author

    Takeda, Toshiro ; Tokoh, Akira

  • Author_Institution
    Sumitomo Bakelite Co. Ltd., Kanagawa, Japan
  • fYear
    1988
  • fDate
    9-11 May 1988
  • Firstpage
    420
  • Lastpage
    424
  • Abstract
    Low-stress polyimide resins that will relax the internal stress (thermal stress) generated in LSI chips encapsulated with mold compound have been developed to prevent passivation films from cracking and to prevent aluminium-conductor slide. The chips were coated with three kinds of polyimide resins (regular, low modulus-of-elasticity and low thermal expansion coefficient), sealed with mold compound. Thermal cycle tests and thermal shock tests were conducted. The results revealed that the low-modulus type has the best stress-relaxing effect, and that the effect decreases in the order of low-thermal-expansion-coefficient type, regular type, and no polyimide coating case, which coincides with the behavior of the thermal stress values calculated. The polyimide resin of low modulus of elasticity has a modulus about half of those of the conventional polyimide resins. As a buffer coating film it offers easy etchability and retains the original heat resistance of the polymer.<>
  • Keywords
    encapsulation; integrated circuit technology; large scale integration; materials testing; polymers; thermal shock; thermal stress cracking; Al conductor slide; LSI chips; buffer coating film; cracking; elasticity modulus; encapsulation; etching; internal stress; low stress polyimide resins; mold compound; passivation films; polymer; stress-relaxing effect; thermal cycle test; thermal expansion coefficient; thermal shock tests; thermal stress; Coatings; Internal stresses; Large scale integration; Passivation; Polyimides; Polymer films; Resins; Testing; Thermal conductivity; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Components Conference, 1988., Proceedings of the 38th
  • Conference_Location
    Los Angeles, CA, USA
  • Type

    conf

  • DOI
    10.1109/ECC.1988.12626
  • Filename
    12626