DocumentCode
2522174
Title
Low power SRAM cell design for FinFET and CNTFET technologies
Author
Delgado-Frias, José G. ; Zhang, Zhe ; Turi, Michael A.
Author_Institution
Sch. of Electr. Eng. & Comput. Sci., Washington State Univ., Pullman, WA, USA
fYear
2010
fDate
15-18 Aug. 2010
Firstpage
547
Lastpage
553
Abstract
Implementations of SRAM cells in FinFET and carbon nanotube FET (CNTFET) technologies are presented in this paper. The International Technology Roadmap for Semiconductors has identified these technologies as likely candidates to replace bulk CMOS. Leakage current is one of the major contributors in the power consumption in SRAM arrays; FinFETs have been shown to greatly reduce leakage current. The FinFET memory cells are presented. These cells dissipate 0.49 μW of static power. The CNTFET memory requires 0.195 μW of static power. In current synthesis processes Metallic CNTs are grown along with semiconductor CNTs, a metallic tolerant scheme is used to overcome the presence of metallic CNT. This CNTFET memory with metallic tolerance dissipates 0.21 μW of static power.
Keywords
MOSFET; SRAM chips; carbon nanotubes; field effect transistors; leakage currents; low-power electronics; nanoelectronics; CNTFET technology; FinFET memory cell; FinFET technology; SRAM array; carbon nanotube FET; leakage current; low power SRAM cell; metallic CNT; metallic tolerant scheme; power 0.21 muW; semiconductor CNT; static power; Arrays; CNTFETs; Layout; Logic gates; Memory management; Microprocessors; Periodic structures; 8T SRAM cell; FinFET; SRAM; carbon nanotube FET; leakage current;
fLanguage
English
Publisher
ieee
Conference_Titel
Green Computing Conference, 2010 International
Conference_Location
Chicago, IL
Print_ISBN
978-1-4244-7612-1
Type
conf
DOI
10.1109/GREENCOMP.2010.5598266
Filename
5598266
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