• DocumentCode
    2522174
  • Title

    Low power SRAM cell design for FinFET and CNTFET technologies

  • Author

    Delgado-Frias, José G. ; Zhang, Zhe ; Turi, Michael A.

  • Author_Institution
    Sch. of Electr. Eng. & Comput. Sci., Washington State Univ., Pullman, WA, USA
  • fYear
    2010
  • fDate
    15-18 Aug. 2010
  • Firstpage
    547
  • Lastpage
    553
  • Abstract
    Implementations of SRAM cells in FinFET and carbon nanotube FET (CNTFET) technologies are presented in this paper. The International Technology Roadmap for Semiconductors has identified these technologies as likely candidates to replace bulk CMOS. Leakage current is one of the major contributors in the power consumption in SRAM arrays; FinFETs have been shown to greatly reduce leakage current. The FinFET memory cells are presented. These cells dissipate 0.49 μW of static power. The CNTFET memory requires 0.195 μW of static power. In current synthesis processes Metallic CNTs are grown along with semiconductor CNTs, a metallic tolerant scheme is used to overcome the presence of metallic CNT. This CNTFET memory with metallic tolerance dissipates 0.21 μW of static power.
  • Keywords
    MOSFET; SRAM chips; carbon nanotubes; field effect transistors; leakage currents; low-power electronics; nanoelectronics; CNTFET technology; FinFET memory cell; FinFET technology; SRAM array; carbon nanotube FET; leakage current; low power SRAM cell; metallic CNT; metallic tolerant scheme; power 0.21 muW; semiconductor CNT; static power; Arrays; CNTFETs; Layout; Logic gates; Memory management; Microprocessors; Periodic structures; 8T SRAM cell; FinFET; SRAM; carbon nanotube FET; leakage current;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Green Computing Conference, 2010 International
  • Conference_Location
    Chicago, IL
  • Print_ISBN
    978-1-4244-7612-1
  • Type

    conf

  • DOI
    10.1109/GREENCOMP.2010.5598266
  • Filename
    5598266