Title :
Application of AFM microscope as a nanolithography tool
Author :
Ramiaczek-Krasowska, Maria ; Prazmowska, Joanna ; Szyszka, Adam ; Paszkiewicz, Regina ; Tlaczala, Marek
Author_Institution :
Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wrocław, Poland
Abstract :
The lithography as a basic process determines properties of microelectronic device. The main area of investigation is the resolution of the lithography operation. The resolution of optical lithography is insufficient for creation of gate electrodes in dedicated to high frequency operation transistors. The scaling ability causes increased interest in using of atomic force microscope (AFM) as nanolithography tool. In the paper, the results of the nanoscratching lithography by using AFM are presented. In this method a pattern is created in mechanical interaction of the AFM tip and the samples surface.
Keywords :
atomic force microscopy; nanolithography; photolithography; transistors; AFM microscope; atomic force microscope; gate electrodes; high frequency operation transistors; microelectronic device; nanolithography tool; nanoscratching lithography; optical lithography; Artificial neural networks; Equations; Resists;
Conference_Titel :
Students and Young Scientists Workshop, 2010 IEEE International
Conference_Location :
Szklarska Poreba
Print_ISBN :
978-1-4244-8324-2
DOI :
10.1109/STYSW.2010.5714172
