Optical and structural properties of V2O5 thin films

In this work optical and structural properties of vanadium (V) oxides in comparison with their structure have been presented. Thin films were deposited on silica substrates by plasma enhanced reactive magnetron sputtering process. After deposition manufactured films were annealed at 400°C in order to form V₂O₅ structure. Optical transmission measurements have shown that as-deposited film was not transparent in visible light range and transparency was increasing in longer wavelength (in NIR range). Additional annealing at 400°C results in increase of transparency range in VIS and in NIR range. Annealing also shifted absorption edge λ_{cut off} in to the shorter wavelength from about 750 nm to 500 nm. Investigation of the structure performed with the aid of Raman spectroscopy have revealed that as-deposited film was amorphous, while annealing results in recrystalization of the structure and forming V₂O₅ phase.